Tin Oxide Ceramic Sputtering Target and Method of Producing It
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United States of America Patent
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Issued Date -
Nov 8, 2012
app pub date -
Sep 21, 2010
filing date -
Oct 15, 2009
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Abandoned
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Abstract
The invention describes a sputtering target comprising a ceramic body having tin oxide as a major constituent and between 0.5 and 15 wt % of at least two other oxides, one of which being antimony oxide, the target having a density of at least 90%, and preferably at least 95%, of the theoretical density (TD) and an electrical resistivity of less than 50 Ohm·cm, and the target having a planar or rotary configuration with a sputtering area of at least 10 cm2, and preferably at least 20 cm2. Also described is a process for manufacturing this sputtering target according comprising the steps of: —providing for a slurry comprising tin oxide and said at least two other oxides, —shaping of a green body from said slurry, and drying said green body, —firing of said green body at a temperature between 1050 and 1250° C., thereby obtaining a pre-shaped target, and —grinding of said pre-shaped target to its final dimensions.
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