DEPOSITION OF SILICON DIOXIDE ON HYDROPHOBIC SURFACES
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United States of America Patent
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Issued Date -
Oct 18, 2012
app pub date -
Feb 13, 2012
filing date -
Feb 14, 2011
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Abandoned
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Abstract
Methods for forming silicon dioxide thin films on hydrophobic surfaces are provided. For example, in some embodiments, silicon dioxide films are deposited on porous, low-k materials. The silicon dioxide films can be deposited using a catalyst and a silanol. In some embodiments, an undersaturated dose of one or more of the reactants can be used in forming a pore-sealing layer over a porous material.
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