ETCHING SOLUTION COMPOSITION FOR TRANSPARENT CONDUCTIVE FILM
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United States of America Patent
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Issued Date -
Oct 11, 2012
app pub date -
Apr 11, 2012
filing date -
Apr 11, 2011
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Abstract
The present invention provides an etching solution composition for etching crystalline transparent conductive films which enables etching of a crystalline ITO film without damaging copper and/or copper alloy used in electrode materials. Etching solution compositions for etching crystalline transparent conductive films described herein consist of an aqueous solution that comprises 1-10 wt % of a fluorine compound.
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