METHOD OF CONTROLLING LITHIUM UNIFORMITY
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United States of America Patent
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Issued Date -
Oct 11, 2012
app pub date -
Mar 26, 2012
filing date -
Apr 7, 2011
priority date (Note) -
Abandoned
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Abstract
A method and apparatus for providing uniform coatings of lithium on a substrate are provided. In one aspect of the present invention is a method of selectively controlling the uniformity and/or rate of deposition of a metal or lithium in a sputter process by introducing a quantity of reactive gas over a specified area in the sputter chamber. This method is applicable to planar and rotating targets.
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