EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD
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United States of America Patent
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Issued Date -
Sep 27, 2012
app pub date -
Mar 12, 2012
filing date -
Mar 23, 2011
priority date (Note) -
Abandoned
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Abstract
An EUV light generation method includes: (1) a step of supplying a target material into a chamber; and (b) a step of generating EUV light from plasma generated by irradiating the target material with a laser beam. The spatial light intensity distribution of the laser beam may be arranged so as to provide a low intensity region with a light intensity lower than a light intensity at a position away from the beam axis by a predetermined distance is present within an area extending for the predetermined distance from the beam axis.
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