SUBSTRATE PROCESSING APPARATUS AND SOLID RAW MATERIAL REPLENISHING METHOD
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United States of America Patent
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Issued Date -
Sep 27, 2012
app pub date -
Mar 21, 2012
filing date -
Mar 22, 2011
priority date (Note) -
Abandoned
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Abstract
Disclosed is a substrate processing apparatus that includes: a processing chamber that accommodates a substrate; and a raw material supply system that sublimates a solid raw material to generate a gas raw material used for processing of the substrate, and supplies the generated gas raw material to the processing chamber. The raw material supply system includes: a solid raw material container that stores the solid raw material; a first piping connected between the solid raw material container and the processing chamber; and a second piping connected with the solid raw material container and equipped with an attachment portion to which a raw material replenishing container that holds the solid raw material for replenishment is attached.
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