ATMOSPHERE STABILIZATION METHOD AND LASER PROCESSING APPARATUS
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United States of America Patent
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app pub date -
Mar 16, 2011
filing date -
Mar 25, 2010
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Abstract
Disruption of a gas atmosphere does not occur when a substrate is rotated 90° after it is carried into a laser processing apparatus. The substrate is carried such that a gas ejection port is positioned near a midportion of a first side of the substrate. The substrate is linearly moved to bring a center of the substrate near the gas ejection port and the substrate is horizontally rotated 90° about the center thereof. Because an edge portion of the gas ejection port does not go beyond a seal cover during rotation, disruption of the gas atmosphere that occurs due to the escaping of the gas does not occur.
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