INTERFEROMETRIC METROLOGY OF SURFACES, FILMS AND UNDERRESOLVED STRUCTURES
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United States of America Patent
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Issued Date -
Sep 6, 2012
app pub date -
Feb 29, 2012
filing date -
Mar 2, 2011
priority date (Note) -
Abandoned
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Abstract
An interferometry method for determining information about a test object includes directing test light to the test object positioned at a plane, wherein one or more properties of the test light vary over a range of incidence angles at the plane, the properties of the test light being selected from the group consisting of the spectral content, intensity, and polarization state; subsequently combining the test light with reference light to form an interference pattern on a multi-element detector so that different regions of the detector correspond to different angles of the test light emerging from the test object, wherein the test and reference light are derived from a common source; monitoring the interference pattern using the multi-element detector while varying an optical path difference between the test light and the reference light; determining the information about the test object based on the monitored interference pattern.
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