ELECTRON BEAM SOURCE SYSTEM AND METHOD
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United States of America Patent
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Issued Date -
Sep 6, 2012
app pub date -
Mar 1, 2011
filing date -
Mar 1, 2011
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Abandoned
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Abstract
An embodiment includes an electron beam source system having a first electron beam source unit with a substrate having a substrate-top end and a substrate-bottom end; and a first lens coupled to the substrate-bottom end defining a first aperture and having a lens-top end and a lens-bottom end. Further embodiments comprise an electron-emission region at the substrate-bottom end and aligned with the first aperture, the electron-emission region being operable to emit one or more electrons due to one or more photons contacting the electron-emission region, which may include passing through the substrate and into the electron-emission region, wherein the electron-emission region comprises a first doped portion of the substrate.
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