METHOD AND SYSTEM FOR DESIGN OF A SURFACE TO BE MANUFACTURED USING CHARGED PARTICLE BEAM LITHOGRAPHY
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United States of America Patent
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Issued Date -
Aug 30, 2012
app pub date -
Feb 28, 2011
filing date -
Feb 28, 2011
priority date (Note) -
Abandoned
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Abstract
A method and system for fracturing or mask data preparation are disclosed which can reduce the critical dimension variation of patterns formed on a resist-coated surface using particle beam lithography by providing a higher peak dosage near the perimeter of the patterns than in the interiors of the patterns.
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