UV Laser System
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United States of America Patent
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N/A
Issued Date -
Aug 30, 2012
app pub date -
Jan 12, 2012
filing date -
Feb 25, 2011
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
In a UV laser system, the problem of deposition of residues of organic substances on the surfaces of optical components is avoided so that the reduction in the laser output can be avoided. A wavelength converting crystal (10) used for the generation of a UV laser light is provided with a reflective plane (14) that selectively reflects the UV laser light (23) to cause the UV laser light to emit from a part of the wavelength converting crystal different from an optical path of a basic wavelength laser light (21). The residues may be deposited on the part of the wavelength converting crystal from which the UV laser light is emitted, but not in the part of thereof through which the basic wavelength laser light passes so that the generation process for the UV laser light is not affected by the deposition of the residues.

First Claim
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SHOWA OPTRONICS CO LTD | 5-3 SHINMACHI 3-CHOME SETAGAYA-KU TOKYO 154-8506 |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Izawa, Takao | Kanagawa, JP | 4 | 19 |
SEKINE, Syunji | Kanagawa, JP | 1 | 0 |
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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