ELECTROSTATIC CHUCK AND METHOD FOR REMOVING REMAINING CHARGES THEREON
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United States of America Patent
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Issued Date -
Aug 9, 2012
app pub date -
Aug 19, 2010
filing date -
Oct 12, 2009
priority date (Note) -
Abandoned
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Abstract
The present invention provides an electrostatic chuck, which includes a base (102) and an electrode (401, 402) arranged inside the base, the electrostatic chuck further includes a charge releasing unit, the electrode can be selectively connected to a power supply arranged outside the electrostatic chuck or connected to the charge releasing unit in order to connect to the power supply to obtain electric energy during the process and connect to the charge releasing unit to release remaining charges on the electrode and then to remove remaining charges on the work piece held on the electrostatic chuck during the charge releasing process. A method for removing remaining charges on the electrostatic chuck is also provided, and the method can release the remaining charges on the electrode and the wafer more thoroughly and rapidly to eliminate the appearance of wafer adherence and wafer crack, so as to reduce possibility of the interruption of the process and improve the production efficiency and yield.
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