SIOx AND VAPOR DEPOSITION MATERIAL FOR BARRIER FILM AND NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM-ION SECONDARY BATTERY EACH USING THE SAME
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United States of America Patent
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N/A
Issued Date -
Jul 19, 2012
app pub date -
Oct 4, 2010
filing date -
Oct 9, 2009
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Provided is SiOx, wherein the amount of generated H2O gas detected in a temperature range of 200 to 800° C. in a temperature-programmed desorption gas analysis is 680 ppm or less. The amount of the generated H2O is desirably 420 ppm or less. In addition, in a graph obtained by X-ray diffraction, the peak intensity P1 at a Si peak point exhibited near 2θ=28° and the base intensity P2 at a peak point interpolated from the gradient of average intensities in the fore and aft positions near the peak point desirably satisfy (P1−P2)/P2≦0.2. This SiOx is used as a vapor deposition material, whereby the generation of splashing is suppressed in forming a film, and a vapor-deposited film having excellent gas barrier properties can be formed. In addition, this SiOx is used as a negative electrode active material, whereby high initial efficiency of a lithium-ion secondary battery can be maintained.
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