FIRING FURNACE CONFIGURATION FOR THERMAL PROCESSING SYSTEM
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United States of America Patent
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Issued Date -
Jul 19, 2012
app pub date -
Jul 15, 2011
filing date -
Jul 15, 2010
priority date (Note) -
Abandoned
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Abstract
A thermal processing system for processing work pieces such as silicon wafers for photovoltaic cells. The system include a firing furnace comprised of upper and lower banks for microzones having infrared lamps in each microzone. The microzone are lined with or formed of a reflective insulative material. Some embodiments of the system of the invention can be used as or in a continuous infrared furnace of oven having a drying, burn-off and firing zone.
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