DISPLACEMENT GOLD PLATING SOLUTION AND METHOD FOR FORMING CONNECTING PORTION

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United States of America Patent

APP PUB NO 20120171367A1
SERIAL NO

13496746

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention provides a displacement gold plating solution and a plating treatment technology capable of realizing a uniform film thickness when forming a connecting portion obtained by sequentially plating a nickel layer, a palladium layer, and a gold layer in layers. The present invention provides a displacement gold plating solution for forming a connecting portion obtained by sequentially plating a nickel layer, a palladium layer, and a gold layer in layers on a conductor layer containing a conductive metal. The displacement gold plating solution contains a gold cyanide salt, a complexing agent, and a copper compound. A molar ratio of the complexing agent and the copper compound in the displacement gold plating solution is in a range of complexing agent/copper ion=1.0 to 500. A compound formed from the complexing agent and the copper compound has a stability constant of 8.5 or higher at a pH of between 4 and 6.

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Patent Owner(s)

Patent OwnerAddress
ELECTROPLATING ENGINEERS OF JAPAN LIMITEDTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kikuchi, Rie Hiratsuka-shi, JP 12 106

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