Method and apparatus for providing multiple wavelength reflectance magnitude and phase for a sample

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United States of America Patent

APP PUB NO 20120170021A1
SERIAL NO

12584203

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Abstract

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A method and apparatus for providing multiple wavelength reflectance magnitude and phase for a sample is disclosed. In one embodiment, at least one of magnitude and/or phase is determined for at least some vacuum ultra-violet (VUV) wavelengths. One embodiment of the method utilizes a broadband referencing reflectometer to obtain an interference signal between reference and sample arms, in addition to the reflected intensities from each arm separately. Combined with a calibration of absolute reflectance magnitude and phase using one or more known calibration standards, the intensity and interference data can be used to obtain reflectance and phase for an unknown sample. In some embodiments, one or more properties of the calibration samples can be determined during the calibration procedure, even when the calibration samples are not stable under operating conditions, or with respect to the manufacture of the calibration samples.

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Patent Owner(s)

Patent OwnerAddress
JORDAN VALLEY SEMICONDUCTORS LTDP O BOX 103 MIGDAL HAEMEK 23100

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Walsh, Phillip Austin, US 27 214

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