ADVANCED PHOTOMASK REPAIR
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United States of America Patent
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Issued Date -
Jun 28, 2012
app pub date -
Jun 29, 2010
filing date -
Jun 30, 2009
priority date (Note) -
Abandoned
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Abstract
Additive repair of advanced photomasks with low temperature or optical curing via direct write lithographic printing with sharp tips and cantilevers. The optical properties of the materials formed from the ink can be tuned (e.g., n and k values). Sol gel inks, including silsesquioxane inks, can be used to form MoSi compositions. The repaired photomasks are resistant to washing under normal photomask washing conditions. AFM instrumentation can be used to perform the additive repair to provide the high resolution and registration.
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