HOLDING/CLEANING DEVICE AND METHOD FOR THE ZONAL CLEANING OF SAWED WAFERS
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United States of America Patent
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Issued Date -
May 31, 2012
app pub date -
Nov 17, 2011
filing date -
Nov 29, 2010
priority date (Note) -
Abandoned
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Abstract
A device for holding a substrate block to be sawed and for flushing the intermediate spaces formed by sawing the substrate block. It comprises two regions arranged parallel to the device longitudinal axis and above one another, the upper region being configured as an adapter region by means of which the device can be connected to a machine instrument, and the lower region being formed as a holding region which comprises a circumferentially closed or closable channel system which can be supplied with flushing liquid by means of closable supply openings and the bottom of which is opened in a slot-like fashion during the sawing of the substrate block so as to provide passage openings for the flushing liquid. A method for flushing intermediate spaces formed by sawing a substrate block using the above device.
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