Sputtering Targets And Recording Materials Of Hard Disk Formed From The Sputtering Target
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United States of America Patent
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Issued Date -
May 10, 2012
app pub date -
Oct 14, 2011
filing date -
Nov 5, 2010
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Abandoned
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Abstract
Disclosed is a sputtering target and its application to the recording material of hard disks wherein the sputtering target comprises cobalt-platinum (CoPt), cobalt-chrome-platinum (CoCrPt) or cobalt-chrome-platinum-boron (CoCrPtB) and a combination of oxides. A recording material is formed by the sputtering target through the sputtering process as a high areal recording density hard disk, which essentially has silica oxide (SiO2) and Cr2O3, wherein the amount of silica oxide (SiO2) ranges from 4 to 8 atomic % and the amount of chromium oxide (Cr2O3) ranges from 0.8 atomic % to 5 atomic %. The present invention is characterized by Cr2O3 as an oxygen supplier during sputtering process to donate oxygen to the oxygen defects. The sputtering target containing the combination of oxides is used to form a recording material applied as a recording layer of magnetic recording medium of hard disks, resulting in enhancement of the areal recording density of medium storage.
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