METHOD OF COATING AN RF DEVICE AND SPUTTERING APPARATUS USED IN THE SAME
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United States of America Patent
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Issued Date -
May 3, 2012
app pub date -
Oct 26, 2011
filing date -
Oct 27, 2010
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Abstract
A method of coating an RF device for reducing cost of manufacture and coating period of time and a sputtering apparatus used in the same are disclosed. The sputtering apparatus used for coating of an RF device includes a supporting member on which an object to be coated corresponding to the RF device is placed, a first target made up of material coated on the object and a second target disposed separately from the first target. Here, power is applied to the first target and the second target when the object is coated.
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