Sulfonium salt, resist composition, and patterning process
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United States of America Patent
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Dec 3, 2013
Grant Date -
Apr 26, 2012
app pub date -
Sep 23, 2011
filing date -
Oct 25, 2010
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Abstract
A sulfonium salt of a naphthyltetrahydrothiophenium cation having a fluoroalkoxy chain with a specific anion is provided. The sulfonium salt is used as a photoacid generator to form a resist composition which when processed by immersion lithography, offers advantages of restrained dissolution in the immersion water and less pattern dependence or dark/bright bias.
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