Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same
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United States of America Patent
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Dec 2, 2014
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N/A
app pub date -
Jul 1, 2010
filing date -
Jul 2, 2009
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Abstract
Disclosed is a colored photosensitive resin composition for a color filter of a solid state imaging device using an ultra-short wavelength exposing device of 300 nm or less, a color filter and a solid state imaging device including the same. The colored photosensitive resin composition can fabricate a color filter having a micro-patterned colored pattern. The color filter can be advantageously applied to a solid state imaging device.
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