RF IMPEDANCE MATCHING NETWORK WITH SECONDARY DC INPUT
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United States of America Patent
Stats
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N/A
Issued Date -
Apr 26, 2012
app pub date -
Oct 20, 2010
filing date -
Oct 20, 2010
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Embodiments of the disclosure may provide a matching network for a physical vapor deposition system. The matching network may include an RF generator coupled to a first input of an impedance matching network, and a DC generator coupled a second input of the impedance matching network. The impedance matching network may be configured to receive an RF signal from the RF generator and a DC signal from the DC generator and cooperatively communicate both signals to a deposition chamber target through an output of the impedance matching network. The matching network may also include a filter disposed between the second input and the output of the impedance matching network.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2010 Application Filing Year
- C23C Class
- 1580 Applications Filed
- 1036 Patents Issued To-Date
- 65.57 % Issued To-Date