DEVICE AND METHOD FOR ANALYSING GAS AND ASSOCIATED MEASUREMENT STATION
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United States of America Patent
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Issued Date -
Apr 19, 2012
app pub date -
Jun 11, 2010
filing date -
Jun 12, 2009
priority date (Note) -
Abandoned
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Abstract
The invention relates to a station for measuring gaseous pollution in a transport enclosure of semiconductor substrates comprising a gas analysis device for determining the concentration of the gas to be analysed, said analysis device including: a diluting unit (3) configured to dilute a flow of gas to be analysed (Q) according to a dilution coefficient (D), and an analysis unit (5) communicating with the diluting unit (3) via a sampling pipe (7) in order to sample a flow of diluted gas (Qa) by pumping, and comprising at least one processing means for: analysing the sampled flow of diluted gas (Qa), and determining the concentration (C) of the gas flow to be analysed (Q) according to said analysed flow of diluted gas (Qa) and the dilution coefficient (D). The invention further relates to an associated gas analysis method.
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