MASK, METHOD AND APPARATUS FOR FORMING SELECTIVE EMITTER OF SOLAR CELL
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
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N/A
Issued Date -
Apr 5, 2012
app pub date -
Aug 30, 2011
filing date -
Sep 30, 2010
priority date (Note) -
Abandoned
status (Latency Note)
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Importance

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Abstract
The present invention discloses a method and an apparatus for forming a selective emitter of a solar cell. The apparatus for forming a selective emitter of a solar cell in accordance with the embodiment of the present invention includes: a transport means configured to transport a substrate having a first emitter layer formed on an upper surface thereof, the first emitter layer having n-type impurities diffused and formed therein, a table configured to be supplied with the substrate from the transport means and to support the supplied substrate, a mask, being placed on the upper side of the first emitter layer and having a patterned opening, and a ramp, being located above the table and applying a heat energy to the first emitter layer that is exposed though the mask.
First Claim
all claims..Other Claims data not available
Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
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DMS CO LTD | 120 6 FLOORS XINGDE CENTRAL ROAD QIXING DISTRICT GYEONGGI DO SOUTH KOREA |
International Classification(s)

- 2011 Application Filing Year
- F27D Class
- 219 Applications Filed
- 150 Patents Issued To-Date
- 68.50 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
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Huh, Yun-Sung | US | 2 | 386 |
# of filed Patents : 2 Total Citations : 386 | |||
Park, Seung-II | US | 2 | 10 |
# of filed Patents : 2 Total Citations : 10 |
Cited Art Landscape
- No Cited Art to Display

Patent Citation Ranking
- 8 Citation Count
- F27D Class
- 14.73 % this patent is cited more than
- 13 Age
Forward Cite Landscape
- No Forward Cites to Display

Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text

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Oct 31, 1996 | FEPP | FEE PAYMENT PROCEDURE | free format text: PAYER NUMBER DE-ASSIGNED (ORIGINAL EVENT CODE: RMPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
May 17, 1996 | FPAY | FEE PAYMENT | year of fee payment: 4 |
Dec 06, 1995 | FEPP | FEE PAYMENT PROCEDURE | free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
Dec 01, 1992 | I | Issuance | |
Nov 20, 1992 | STCF | INFORMATION ON STATUS: PATENT GRANT | free format text: PATENTED CASE |
Apr 02, 1991 | F | Filing | |
Mar 21, 1991 | AS | ASSIGNMENT | free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:FUKUDA, MASAHISA;REEL/FRAME:005691/0519 Owner name: BANDO KAGAKU KABUSHIKI KAISHA DBA BANDO CHEMICA Effective Date: Mar 21, 1991 |
Apr 17, 1990 | PD | Priority Date |

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