PHOTOLITHOGRAPHY PROCESS FOR SEMICONDUCTOR DEVICE
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United States of America Patent
Stats
-
N/A
Issued Date -
N/A
app pub date -
Dec 14, 2011
filing date -
Oct 19, 2007
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Provided is a non-transitory computer readable medium including instructions to generate a level sensor map and create a compensation map from the level sensor map. The level sensor map includes a first determination of a first height above a reference plane of a feature disposed on a semiconductor substrate, and a second determination of a second height above the reference plane of a second feature disposed on a semiconductor substrate. The first and second feature are in a single exposure field. The compensation map includes a determination of at least one parameter to be used during exposure of a single field during an exposure process for the semiconductor substrate.
First Claim
Other Claims data not available