SYSTEM AND METHOD FOR REMOVING ORGANIC RESIDUE FROM A CHARGED PARTICLE BEAM SYSTEM
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United States of America Patent
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app pub date -
Dec 12, 2011
filing date -
Aug 8, 2005
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Abandoned
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Abstract
A system and method for removing an organic residue from a charged particle beam system includes a conduit that is coupled to the column and is for adding oxygen to the column. A heater is coupled to the column and is for increasing the temperature in the column. A pump is coupled to the column and is for removing a gas from the chamber, wherein the gas is a byproduct of a chemical reaction of the organic residue and the oxygen.
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