CRACK STOP STRUCTURE ENHANCEMENT OF THE INTEGRATED CIRCUIT SEAL RING

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United States of America Patent

SERIAL NO

13245554

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Abstract

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An improved crack stop structure (and method of forming) is provided within a die seal ring of an integrated circuit die to increase crack resistance during the dicing of a semiconductor wafer. The crack stop structure includes a stack layer (of alternating insulating and conductive layers) and an anchor system extending from the stack layer to a predetermined point below the surface of the substrate. A crack stop trench is formed in the substrate and filled with material having good crack resistance to anchor the stack layer to the substrate.

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Patent Owner(s)

Patent OwnerAddress
CHARTERED SEMICONDUCTOR MANUFACTURING LTD60 WOODLANDS INDUSTRIAL PARK D STREET 2 SINGAPORE 738406

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chan, Kai Chong Singapore, SG 18 199
Yeo, Alfred Singapore, SG 4 26

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