METHOD FOR REMOVING DEPOSITED SLUDGE
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United States of America Patent
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Issued Date -
Mar 29, 2012
app pub date -
Apr 5, 2011
filing date -
Sep 28, 2010
priority date (Note) -
Abandoned
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Abstract
Provided is a physical and chemical cleaning method, including introducing nitrogen gas, liquid nitrogen or dry ice into a cleaning solution containing at least one selected from the group consisting of water, monoethanolamine (ETA), dimethylamine (DMA), NH3, ethylenediaminetetraacetic acid (EDTA), diethylenetriaminepentaacetic acid (DTPA) and N2H2 to remove sludge. The physical and chemical cleaning method is capable of removing sludge, generated or deposited on the substrate surfaces, surfaces of constitutional parts, or gaps in various systems and instruments, more effectively. The physical and chemical cleaning method may be applied to cleaning of steam generators, boilers, heat exchangers, or the like, used in atomic power stations.
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