METHOD FOR MONITORING PHOTOLITHOGRAPHY PROCESS AND MONITOR MARK
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United States of America Patent
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app pub date -
Nov 23, 2011
filing date -
Jul 17, 2008
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Abstract
A method for monitoring a photolithography process includes providing a monitor mark having high sensitivity of the focus of the photolithography process, transferring the monitor mark together with the product patterns through the photolithography process onto a substrate, and measuring the deviation dimension of the monitor mark formed on the substrate to real-time monitor the focus of the photolithography process.
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