Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method
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United States of America Patent
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May 13, 2014
Grant Date -
Mar 22, 2012
app pub date -
Nov 30, 2011
filing date -
Dec 5, 2006
priority date (Note) -
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Abstract
An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the cleaning liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved.
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