REACTOR LID ASSEMBLY FOR VAPOR DEPOSITION
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United States of America Patent
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Issued Date -
Mar 22, 2012
app pub date -
Mar 16, 2010
filing date -
Mar 16, 2009
priority date (Note) -
Abandoned
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Abstract
Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a reactor lid assembly for vapor deposition is provided which includes a first showerhead assembly and an isolator assembly disposed next to each other on a lid support, and a second showerhead assembly and an exhaust assembly disposed next to each other on the lid support, wherein the isolator assembly is disposed between the first and second showerhead assemblies and the second showerhead assembly is disposed between the isolator assembly and the exhaust assembly.
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