PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

United States of America Patent

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Issued Date
Mar 15, 2012
app pub date
Jul 8, 2011
filing date
Sep 13, 2010

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Abandoned

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Abstract

A photoresist composition and method of forming a pattern using the same are provided. The photoresist composition includes a 60 to 90 wt % novolac resin, a diazide compound, an organic solvent, and an anticorrosive agent.

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Patent Owner(s)

Patent Owner	Address
SAMSUNG TECHWIN CO LTD	GYEONGNAM SOUTH KOREA

International Classification(s)

G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
KIM, Ki-Soo	Changwon-si, KR	93	1517
LIM, Hyun-Tae	Changwon-si, KR	2	33
YU, Dong-Guk	Changwon-si, KR	1	1

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PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America Patent

13179106

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13179106

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