PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

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United States of America Patent

APP PUB NO 20120052438A1
SERIAL NO

13117032

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Abstract

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A photoresist composition and method of forming pattern using the same are provided. The photoresist composition contains an alkali-soluble novolac resin, a photosensitizer including a compound of Chemical Formula 1, and a solvent.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG DISPLAY CO LTD95 SAMSUNG 2 RO GIHEUNG-GU YONGIN-CITY GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kang, Deok-Man Seongnam-si, KR 11 28
KIM, Cha-Dong Hwaseong-si, KR 36 125
Kim, Youn-Suk Yongin-si, KR 2 3
Lee, Hi-Kuk Yongin-si, KR 72 259
Oh, Sae-Tae Pyeongtack-si, KR 10 19
Park, Jung-In Suwon-si, KR 32 108
Yun, Sang-Hyun Suwon-si, KR 25 50

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