Substrate Structure Grown By Plasma Deposition

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United States of America Patent

APP PUB NO 20120052242A1
SERIAL NO

13318238

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Substrate structure comprising a substrate (6) and a plasma grown layer (6a). The surface of the resulting substrate structure (7) is characterized by interrelated scaling components. The scaling components comprise a roughness exponent α, a growth exponent β and a dynamic exponent z, wherein the growth exponent β has a value of less than 0.2 and the dynamic exponent z has a value of more than 6. Also disclosed is a method to provide such a substrate structure.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM MANUFACTURING EUROPE B VOUDENSTAART 1 TILBURG 5047 TK

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Vries Hindrik Willem Tilburg, NL 20 1059
Van, De Sanden Mauritus Cornelius Maria Tilburg, NL 1 1

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