Method of manufacturing magnetoresistive element
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United States of America Patent
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Apr 1, 2014
Issued Date -
N/A
app pub date -
Jul 19, 2011
filing date -
Sep 1, 2010
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
According to one embodiment, a method of manufacturing a magnetoresistive element includes a layered structure and a pair of electrodes, the layered structure including a cap layer, a magnetization pinned layer, a magnetization free layer, a spacer layer and a functional layer provided in the magnetization pinned layer, between the magnetization pinned layer and the spacer layer, between the spacer layer and the magnetization free layer, in the magnetization free layer, or between the magnetization free layer and the cap layer and including an oxide, the method including forming a film including a base material of the functional layer, performing an oxidation treatment on the film using a gas containing oxygen in a form of at least one selected from the group consisting of molecule, ion, plasma and radical, and performing a reduction treatment using a reducing gas on the film after the oxidation treatment.
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Cited Art Landscape
Patent Citation Ranking
- 3 Citation Count
- G11B Class
- 8.79 % this patent is cited more than
- 11 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Oct 1, 2025 |
