Material for Manufacturing Targets for Physical Vapor Deposition of P-Type Transparent Conductive Films
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United States of America Patent
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Issued Date -
Mar 1, 2012
app pub date -
Nov 30, 2009
filing date -
Dec 8, 2008
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Abandoned
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Abstract
The invention describes a powderous oxide material (MxM′y)Cu2+a O2+b for the production of targets for p-type transparent conductive thin films, wherein −0.2≦a≦0.2, −0.2≦b≦0.2 and either —M′ is Sr and M is either one or both of Ba and bivalent Cu, with x>0, y>0 and x+y=1 ±0.2; or —M is bivalent Cu, x=1 ±0.2, and y=0.
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