MASK INSPECTION APPARATUS AND METHOD
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United States of America Patent
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Issued Date -
Feb 16, 2012
app pub date -
Feb 2, 2005
filing date -
Feb 5, 2004
priority date (Note) -
Abandoned
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Abstract
Apparatus for optical inspection of an object, comprising: an optical imaging system (5) for generating an actual image of the real object, a calculation unit (12) for calculating an estimated image of an object of desired shape in respect of a known aberration coefficient of the optical imaging system, an image analysis unit (13) for detecting differences between the actual image and the image calculated by the calculation unit (12).
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