Multiply Divided Anode Wall Type Plasma Generating Apparatus and Plasma Processing Apparatus
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United States of America Patent
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Issued Date -
Feb 16, 2012
app pub date -
May 6, 2010
filing date -
Jul 1, 2009
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Abstract
An object of the present invention is to provide a multiply divided anode wall type plasma generation apparatus, wherein a short circuit between the cathode and the anode is not caused even if deposited matter adhering and depositing on the inner wall of the anode by diffusion plasma detach and fall. Also, an object is to provide a plasma processing apparatus using the same.), and thus a short circuit between both electrodes is prevented.
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