METHOD FOR CLEANING SILICON SLUDGE
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United States of America Patent
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Issued Date -
Feb 9, 2012
app pub date -
Apr 19, 2010
filing date -
Apr 28, 2009
priority date (Note) -
Abandoned
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Abstract
After removing organic matters and forming a silicon oxide film by ozone-oxidizing a silicon powder in silicon sludge, the ozone is removed and the resulting sludge is dispersed into hydrochloric acid for dissolving metal impurities thereinto. Then, the supernatant liquid of the hydrochloric acid is removed, and the silicon oxide film is dissolved with hydrofluoric acid after being rinsed with ultrapure water, so that the metal impurities in the surface layer of the silicon powder are removed.
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