Nano-imprinting resin stamper and nano-imprinting apparatus using the same

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United States of America Patent

PATENT NO 8690559
SERIAL NO

13193666

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Abstract

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The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.

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Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH-TECHNOLOGIES CORPORATION24-14 NISHI SHIMBASHI 1-CHOME MINATO-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishii, Satoshi Hitachi, JP 161 2085
Miyauchi, Akihiro Hitachi, JP 83 1546
Mori, Kyoichi Oiso, JP 37 330
Ogino, Masahiko Hitachi, JP 110 1695
Shizawa, Noritake Ninomiya, JP 35 217

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