Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist patterning process
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United States of America Patent
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Oct 22, 2013
Grant Date -
Jan 26, 2012
app pub date -
Jun 24, 2011
filing date -
Jul 23, 2010
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Abstract
There is disclosed a substrate to be processed having laminated thereon a resist film for electron beam and an organic conductive film, in which at least a resist film for electron beam and an organic conductive film are laminated in order on a substrate to be processed having a conductive inorganic thin film as its surface layer, wherein a surface to be processed of the substrate to be processed has an area of direct contact between the organic conductive film and the conductive inorganic thin film in part thereof. There can be a substrate to be processed capable of forming a resist pattern stably and accurately with efficient removal of electricity even when an electron beam with high current density is irradiated.
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