Polishing slurry for chalcogenide alloy
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United States of America Patent
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Issued Date -
Jan 5, 2012
app pub date -
Jul 1, 2010
filing date -
Jul 1, 2010
priority date (Note) -
Abandoned
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Abstract
The invention provides a chemical mechanical polishing composition for chemical mechanical polishing of a chalcogenide phase change alloy substrate. The composition comprises by weight percent, water, 0.1 to 30 colloidal silica abrasive, at least one polishing agent selected from 0.05 to 5 halogen compound, 0.05 to 5 phthalic acid, 0.05 to 5 phthalic anhydride and salts, derivatives and mixtures thereof. The chemical mechanical polishing composition has a pH of 2 to less than 7.
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