Liquid precursor for deposition of copper selenide and method of preparing the same
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United States of America Patent
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Issued Date -
Dec 22, 2011
app pub date -
May 17, 2011
filing date -
May 21, 2010
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Abandoned
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Abstract
Liquid precursors containing copper and selenium suitable for deposition on a substrate to form thin films suitable for semiconductor applications are disclosed. Methods of preparing such liquid precursors and methods of depositing a precursor on a substrate are also disclosed.
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