Imprinting method and imprinting apparatus, sample shot extraction method, and article manufacturing method using same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9651860
SERIAL NO

13162629

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Provided is an imprinting method that is capable of strictly performing the interpolation of the application distribution of an uncured resin material to be applied to a substrate for each shot as well as efficiently performing the reinterpolation of the application distribution of the uncured resin material for each shot while reducing the workload in a generation step. The imprinting apparatus of the present invention includes a mold 20 on which a mold pattern is formed; a mold driving unit 14 that allows the mold 20 move toward and away from a substrate 30; a dispenser 17 that applies an uncured resin material to the substrate 30; a light source 19 that cures the uncured resin material as a resin pattern; a dispenser control unit 43 that controls the dispenser 17 by generating the application distribution of the uncured resin material to the resin pattern for each of a plurality of shots; and a main control unit 40 that interpolates the application distribution of the uncured resin material, which has been generated by the dispenser control unit 43, using shot layout information in consideration of the relative position among the positions of a plurality of shots, the dispenser 17, and the light source 19 with respect to the substrate 30, as variables.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
CANON KABUSHIKI KAISHAJAPAN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aihara, Sentaro Utsunomiya, JP 19 33

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 Nov 16, 2024
11.5 Year Payment $7400.00 $3700.00 $1850.00 Nov 16, 2028
Fee Large entity fee small entity fee micro entity fee
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00