METHOD FOR NANOPATTERNING USING NANOMASKS AND LIGHT EXPOSURE
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United States of America Patent
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Issued Date -
Dec 8, 2011
app pub date -
Jun 3, 2011
filing date -
Jun 4, 2010
priority date (Note) -
Abandoned
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Abstract
A nanomask for generating an illumination pattern includes a layer having a first surface and a second surface and a plurality of resonant nano-features disposed on at least a selected one of the first surface and the second surface. The nanomask is configured to provide an illumination pattern adjacent to the second surface. The illumination pattern has dimensions smaller than a wavelength λ of electromagnetic radiation used to illuminate the first surface of the layer in a single illumination. A nanopatterning method is also described.
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