METHOD FOR PRETREATING SUBSTRATES FOR PVD METHODS
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United States of America Patent
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Oct 27, 2009
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Nov 18, 2008
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Abstract
The invention relates to a method for surface treatment of work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source; by means of the first electrode, an arc is operated with an arc current and vaporizes material from the target that is deposited at least partially and intermittently onto the work pieces and having a second electrode that is embodied as a work piece holder and, together with the work pieces, constitutes a bias electrode; by means of a voltage supply, a bias voltage is applied to the bias electrode, with the bias voltage applied so that it is matched to the arc current such that essentially, no net material buildup on the surface occurs.
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