GAS DELIVERY DEVICE
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United States of America Patent
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Issued Date -
Nov 3, 2011
app pub date -
Jul 13, 2009
filing date -
Jul 17, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A gas delivery device is for use in low pressure Atomic Layer Deposition at a substrate location. The device includes a first generally elongate injector for supplying process gas to a process zone, a first exhaust zone circumjacent the process zone, and a further injector circumjacent the first exhaust gas for supplying purge or inert gas at an outlet surrounding the process zone having a wall for facing the location circumjacent the outlet to define at least a partial gas seal.
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