METHOD AND SYSTEM FOR STENCIL DESIGN FOR PARTICLE BEAM WRITING
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United States of America Patent
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app pub date -
Jul 1, 2011
filing date -
Sep 15, 2005
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Abandoned
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Abstract
Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.
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