FILTER MEDIA FOR LIQUID PURIFICATION TO REMOVE TRACE METALS
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Oct 27, 2011
app pub date -
Apr 22, 2011
filing date -
Apr 26, 2010
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Filter media for liquid purification, which can remove metal compounds or metal ions containing in polishing or washing liquids such as alkali, acid solution or ultra-pure water used for silicon wafers of semiconductors. Removal of metals from various kind of liquid such as inorganic chemicals, organic solvent, or industrial waste water are also the subject of the present invention./10 min or more, and wherein said melt-blown nonwoven substrate is constituted of fibers having an average fiber diameter ranging from 1 to 30 μm is applied. On such melt-blown nonwoven substrate, ion-exchangeable or chelate group is introduced through graft polymerization of vinyl monomer.[wherein ethylene unit (X) and norbornene unit (Y) is chosen from 1 to 99 mole %][wherein m and n represent degree of polymerization and are chosen from 1 or more.]
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully